Niobium Target

MH supply 99.95% and 99.9% purity niobium targets, Rectangular / Square Target and Tubular Target, manufactured from high-quality niobium raw materials with strict control of chemical composition, density, and microstructure, ensuring stable sputtering behavior and uniform film properties.

MH Niobium Target Purity Grades Available

99.95% (4N) Niobium Target

● Ultra-high purity with extremely low metallic and gaseous impurities

● Stable plasma, low particle generation

● Suitable for semiconductor, superconducting, and high-end electronic films

99.9% (3N) Niobium Target

● High purity with excellent cost-performance ratio

● Reliable sputtering stability for industrial coating applications

● Suitable for general electronic, optical, and functional coatings

MH Niobium Target Forms

We supply niobium targets in multiple geometries to match different sputtering systems:

Rectangular / Square Target

● Planar sputtering systems

● Magnetron sputtering cathodes

● Large-area uniform film deposition

Tubular Target

● Rotary sputtering systems

● Higher target utilization rate

● Improved coating uniformity and production efficiency

(Custom dimensions and bonding options available upon request.)

MH Niobium Target Specification Range

Purity	99.9%, 99.95%
Density	≥99.9% of theoretical density
Grain Structure	Fine and uniform
Surface Finish	Ra0.4
Rectangular / Square Target	Length ≤3000mm, Width ≤800mm, Thickness (mm) 1~20mm
Tubular Target	Outer Diameter 10-400mm, Wall 2-28mm

99.95% vs 99.9% – Selection Guide

Item	99.95% Nb Target	99.9% Nb Target
Purity Level	Ultra-high purity (4N)	High purity (3N)
Impurity Content	Extremely low	Low
Film Quality	Highest uniformity & stability	Stable, industrial-grade
Particle Generation	Minimal	Low
Typical Applications	Semiconductor, superconducting films, R&D	Optical coatings, functional films, mass production
Cost Level	Higher	More economical

Rectangular vs Tubular Target – Selection Guide

Comparison	Rectangular / Square Target	Tubular Target
Process Compatibility	Planar Sputtering, Magnetron Sputtering	Cylindrical Sputtering
Material Utilization	20%~30%	70%~85%
Procurement Cost	Moderate	Much higher than plate targets
Production Efficiency	Small batches, multi-variety coatings	Large batches and continuous coatings
Surface Treatment	Fine Grinding and Polishing	Fine grinding, more difficult
Materials Proposed	Pure Niobium (99.95%), Nb-1Zr	Pure Niobium (99.95%), Nb-1Zr (High Temperature Special Purpose)

MH Niobium Target Typical Applications

Semiconductor thin films

Superconducting niobium coatings

Optical and decorative coatings

Display and electronic devices

Research and advanced functional films

Why Choose MH Niobium Targets

● High Purity & Stable Sputtering Performance

● Uniform Microstructure and High Density

● Multiple Geometries Available: Rectangular & Tubular

● Custom Dimensions and Bonding Solutions

● Proven Use in Advanced Coating Applications

Our niobium sputtering targets deliver reliable purity, consistent sputtering behavior, and high-quality film performance for demanding thin film applications.